NANOVAK SYSTEM SELECTION GUIDE

NANOVAK SYSTEM PRE-SELECTION GUIDE

Please complete the following informations to get right system selection solutions.
Please briefly describe the application (s) to be performed
Chamber Dimensions & Vacuum Level

System Chamber Dimensions (WxLxH)cmin 30 minutes from atmosphere (Torr)Base Pressure (Torr)
Is Your Substrate
Substrate Bias
Do you require substrate heating or cooling? If Yes, please, specify the temperature value.

Other
Substrate pre-clean
Glovebox Interface. If Yes, please, specify how many arms needed.

Other
Materials to be deposited
Typical film thickness
Process
Do you require film thickness monitor?
Do you require film thickness controller?
Describe the deposition sources required
Configured for co-deposition
Ion assisted deposition
Process gases to be used.
If Yes, please, specify the gas flow rate value with one of these units (sccm, slm).
Sputtering Orientation
Source-To-Substrate Distance
If receiving sputtering, will a substrate process gas ring be required?
If Sputtering
Power requirement
Do you require source accessories
Do you have written specifications?
Level of System Automation
What is your typical budget? (this helps to determine the most suitable instrument)
When do you need your system approximately?
Anything else we need to know to assist you?
FR-118 / R0.2
NANOVAK Ar-Ge Bilişim Mühendislik Danışmanlık Sanayi ve Ticaret Anonim Şirketi Adres: Hacettepe Üniversitesi Teknokenti, 4. Ar-Ge Binası, Bina No: 95/A, Ofis No: 4-5, Pk: 06800 Beytepe Çankaya ANKARA Tel: +90 (312) 299 23 93, Faks: +90 (312) 299 23 94, www.nanovak.com, bilgi@nanovak.com,Vergi: Doğanbey 629 056 7265
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NANOVAK SYSTEM PRE-SELECTION GUIDE