NANOVAK SYSTEM PRE-SELECTION GUIDE
Please complete the following informations to get right system selection solutions.
Please briefly describe the application (s) to be performed
Chamber Dimensions & Vacuum Level
System Chamber Dimensions (WxLxH)cm
in 30 minutes from atmosphere (Torr)
Base Pressure (Torr)
Is Your Substrate
Static
Rotating
Single Axis
Dual Axis
Linear Motion
Substrate Bias
RF
DC
Both
none
Do you require substrate heating or cooling? If Yes, please, specify the temperature value.
Heating (°C)
Cooling (°C)
Other
Substrate pre-clean
Glow Discharge
Ion Source
Glovebox Interface. If Yes, please, specify how many arms needed.
Yes
No
Other
Materials to be deposited
Typical film thickness
Process
Magnetron Sputtering
Thermal Evaporation
E-Beam
Glove Box Adapted
PECVD
HiPIMS
Do you require film thickness monitor?
Yes
No
Do you require film thickness controller?
Yes
No
Describe the deposition sources required
Configured for co-deposition
Yes
No
Ion assisted deposition
Yes
No
Process gases to be used.
If Yes, please, specify the gas flow rate value with one of these units (sccm, slm).
Sputtering Orientation
Up
Down
Off Axis
Source-To-Substrate Distance
If receiving sputtering, will a substrate process gas ring be required?
Yes
No
If Sputtering
RF
DC
Both
Power requirement
Do you require source accessories
Flex head (for magnetron)
Chimneys
Shutters
Do you have written specifications?
RF
DC
Both
Level of System Automation
Recipe Driven Computer Control for multilayer
Receipt with single alyer control
What is your typical budget? (this helps to determine the most suitable instrument)
Economy
Mid-Range
Premium
When do you need your system approximately?
Anything else we need to know to assist you?
Formu Gönder
Should be Empty: